|
Useful Links |
|
|
Article Details :: |
|
|
| Article Name : | | | Ion chemistry of tetramethylsilane (TMS) by electron impact | | Author Name : | | | Sham Singh Saini And Praveen Bhatt | | Publisher : | | | Ashok Yakkaldevi | | Article Series No. : | | | GRT-2880 | | Article URL : | |  | Author Profile View PDF In browser | | Abstract : | | | We studied electron impact ionization of tetramethylsilane (TMS), Si(CH3)4, which is utilized in plasma polymerization applications, using a semi empirical Jain-Khare theoretical technique. Absolute partial cross sections for the formation of all fragment ions were measured by Jain-Khare method from threshold up to 120 eV. We obtained the following sixteen ions: CH3+, Si+, SiH+, SiH3+, SiCH2+, SiCH3+, HSiCH3+, H2SiCH3+, SiC2H+, SiC2H3+, SiC2H5+,Si(CH3)2+, HSi(CH3)2+, Si(CH3)3+, HSi(CH3)3+ & Si(CH3)4+. The agreement between our measured absolute partial ionization cross-sections & R.Basner et al data sets obtained by experimental technique are generally good for the silicon-containing fragment ions. The earlier work done is for 90 eV & here we have extended it up to from threshold to 120 eV. | | Keywords : | | |
|
|